Chemoselective Deprotection of Thioacetals/Thioketals Using HIO3 in the Presence of Wet SiO2 Under Mild Solvent-Free Conditions

Research

Title	Chemoselective Deprotection of Thioacetals/Thioketals Using HIO3 in the Presence of Wet SiO2 Under Mild Solvent-Free Conditions
Type	JournalPaper
Keywords	Carbonyl compounds; deprotection; HIO3/wetSiO2; solvent-free; thioacetals/ thioketals
Year	2006
Journal	Phosphorus, Sulfur, and Silicon and the Related Elements
DOI
Researchers	Moslem Mansour Lakouraj ، mahmood tajbakhsh ، Farhad Shrini ، Mohammad Asady Tamami

Abstract

HIO3 in the presence of wet SiO2 is highly efficient and a mild reagent for selective deprotection of a variety of thioacetals/thioketals to the corresponding parent carbonyl compounds at room temperature and under solvent-free conditions

mahmood tajbakhsh

Research

Abstract